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Luminescence Properties and Mechanisms of CuI Thin Films Fabricated by Vapor Iodization of Copper Films

机译:铜膜气相碘化法制备CuI薄膜的发光特性及机理

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摘要

Copper iodide (CuI) thin films were grown on Si(100) substrates using a copper film iodination reaction method. It was found that γ-CuI films have a uniform and dense microstructure with (111)-orientation. Transmission spectra indicated that CuI thin films have an average transmittance of about 60% in the visible range and the optical band gap is 3.01 eV. By checking the effect of the thickness of the Cu films and annealing condition on the photoluminescence (PL) character of CuI films, the luminescence mechanisms of CuI have been comprehensively analyzed, and the origin of different PL emissions are proposed with Cu vacancy and iodine vacancy as defect levels.
机译:使用铜膜碘化反应方法,在Si(100)衬底上生长碘化铜(CuI)薄膜。发现γ-CuI膜具有(111)取向的均匀且致密的微观结构。透射光谱表明,CuI薄膜在可见光范围内的平均透射率为约60%,光学带隙为3.01 eV。通过研究Cu膜厚度和退火条件对CuI膜光致发光(PL)特性的影响,综合分析了CuI的发光机理,并提出了Cu空位和碘空位的不同PL发射源。作为缺陷级别。

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