首页> 中文期刊> 《中国有色金属学报:英文版》 >Thermal activation approaches to deformation mechanisms for high Nb containing TiAl base alloys

Thermal activation approaches to deformation mechanisms for high Nb containing TiAl base alloys

         

摘要

The deformation mechanisms in a wide temperature range from room temperature to 1 200 K were investigated by thermal activation approach. Using observed instantaneous stress response to the strain rate jump (Δ σ tr ), the activation volume V a, then the activation enthalpy Δ H , activation free enthalpy Δ G and activation entropy Δ S were calculated. The apparent activation energy of high temperature deformation is estimated to be 3.66 eV, which is larger than the self diffusion coefficient of binary TiAl (3.01 eV). The dislocations at 1 173 K are generally curved or bowed, even helical shaped dislocations. The climb of ordinary dislocations as well as twinning has greatly contributed to the plastic deformation. The CRSS at 1 173 K is estimated to be 180 MPa. The higher resisting stress at both room temperature and elevated temperature might relate to the high Nb content of the alloy.

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