含磷聚酰亚胺薄膜在原子氧环境中的降解研究

摘要

The degradation of phosphorus-containing polyimide (PI) films in the simulated atom oxygen environment is investigated using the samples developed in our laboratory. The test results from scanning electron microscope (SEM) and X-ray photoelectron spectroscopy (XPS) indicate that the phosphorous and oxygen element contents in the PI film surfaces are increased significantly after the atomic oxygen irradiation; meanwhile, the binding energies are increased at the same time, which suggests that a surface layer of phosphorus oxide is formed to inhibit the further erosion of the underlined PI film surface. Thus, the present PI films exhibit a good atomic oxygen resistance, whose mass loss rates are much lower than that of the Kapton film.%文章考察了自行合成的含磷聚酰亚胺(PI)薄膜在模拟原子氧环境中的降解行为.扫描电子显微镜(SEM)、X射线光电子能谱(XPS)等测试结果表明:在原子氧辐照过程中,含磷PI薄膜表面的磷元素与氧元素含量增加,原子结合能也增大,意味着在PI表面形成了含磷钝化层.该钝化层进一步阻止了PI次表面层被侵蚀,使含磷PI薄膜表现出了抗原子氧侵蚀能力,其在模拟原子氧环境中的质量损失率远低于Kapton薄膜.