The structure and thermal stability of Ti/Al multilayers (A =9.25 nm, T = 0. 3 , N = 20) deposited by a facing-target sputtering system at argon pressures of 0.5 Pa and 2.0 Pa were studied. The X-ray diffraction (XRD) and atomic force microscopy (AFM) were used for analyzing the modulation structure of the multilayers. It was found that the structure and thermal stability are the function of sputtering pressure. The multilayers prepared under lower sputtering pressure of 0. 5 Pa exhibit relatively high quality, textured crystalline layers, low surface roughness and high thermal stability. On the other hand,higher sputtering pressure of 2.0 Pa results in random orientation,high surface roughness, unstable and poor modulation structure.%为研究Ti/Al多层膜的结构和热稳定性与溅射气压的关系,采用对向靶直流磁控溅射法在0.5、2.0 Pa的溅射气压下制备了Ti/Al软X射线光学多层膜(Λ=9.25 nm,Г=0.3,N=20),并采用低角度X射线衍射、高角度X射线衍射和原子力显微镜对其结构和热稳定性进行表征.发现:低溅射气压(0.5 Pa)下制备的多层膜具有相对高质量、有序的结晶层,导致了相对较小的表面粗糙度,热稳定性好；高溅射气压(2.0 Pa)下制备的多层膜周期性结构相对较差,晶向较为无序,表面粗糙度较大,结构热稳定性差.可见,Ti/Al多层膜的结构和热稳定性是溅射气压的函数,低溅射气压下制备的多层膜会获得更好的结构和热稳定性.
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