The oxidation of aluminium was studied using optical emission spectroscopy (OES)during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratioof the measured line intensities of AI-O with that of A1 follows the exact trend as of that obtainedfrom the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. Inthis paper the inherent capacity of emission spectroscopy in evaluating the growth processes underplasma induced reactions is presented.
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