首页> 中文期刊> 《等离子体科学和技术(英文版)》 >A New Approach to Plasma CVD of TiO2 Photocatalyst on γ-Al2O3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure

A New Approach to Plasma CVD of TiO2 Photocatalyst on γ-Al2O3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure

         

摘要

A supported TiO2/γ-Al2O3 photocatalyst has been prepared by γ-Al2O3 pellet-filled dielectric barrier discharges induced plasma CVD at atmospheric pressure and room temperature.The TiO2/γ-Al2O3 photocatalyst exhibits higher photocatalytic activity than Degussa P25, and much higher photocatalytic activity than that prepared by thermal CVD.

著录项

  • 来源
    《等离子体科学和技术(英文版)》 |2004年第6期|2546-2548|共3页
  • 作者单位

    Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China;

    Center for Nano Materials and Science, Dalian University of Technology, Dalian 116024, China;

    Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China;

    Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China;

    Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China;

    Center for Nano Materials and Science, Dalian University of Technology, Dalian 116024, China;

    Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China;

    Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China;

    Center for Nano Materials and Science, Dalian University of Technology, Dalian 116024, China;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类
  • 关键词

    plasma CVD; dielectric barrier discharges; photocatalyst;

    机译:等离子体化学汽相淀积;介质阻挡放电;光催化剂;
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号