By ECH under a steady B_v field,a closed field equilibrium of a low aspect ratio aslow as R/a=1.4 is spontaneously formed in the LATE device.After the spontaneous formation,the plasma current has increased further up to I_P=7.2 kA by 2.45 GHz,30 kW and I_P=11 kA by 5 GHz,120 kW,by increasing the microwave power with a slow ramp of B_v for theequilibrium of the plasma loop at larger currents.Both amount to 12% of the total toroidal coilcurrent.ECH/ECCD at 2ud harmonic resonance of EBW supports the plasma.An outline of thetheoretical considerations for the formation process is presented.
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机译:Excellent formability (成形 性), forming after high artificial aging curing (人工 时效 硬化 性), high strength, low yield ratio (降 伏 比) and high ductility (延性) and with aspects rivers sheet (雨 相 钢 sheet) manufacturing How to