首页> 中文期刊> 《激光与红外》 >Hg1-xCdxTe/CdTe/Si薄膜厚度测试方法的研究

Hg1-xCdxTe/CdTe/Si薄膜厚度测试方法的研究

         

摘要

High quality CdTe/Si composite substrate is grown by molecular beam epitaxy. We develop Hg1-xCdxTe/ CdTe/Si which is an important infrared material and used for making infrared detector by MBE and LPE respectively. The infrared transmission spectrum of Hg1-xCdxTe/CdTe/Si by FTIR is analyzed and then the film thickness is calculated. The SEM measurement result is used for correcting. Finally, we establish a non-destructive, non-polluted,fast and convenient measurement method for multilayer film thickness.%在分子束外延生长高质量的CdTe/Si复合衬底上,分别通过MBE和LPE技术成功地研制出Hg1-xCdxTe/CdTe/Si红外探测器所需的重要红外半导体材料.利用傅里叶变换红外光谱仪对Hg1-xCdxTe/CdTe/Si红外半导体材料的红外透射光谱进行测试分析且计算薄膜厚度,并配合扫描电子显微镜对其厚度计算分析进行校正,最终获得一种无破坏、无污染、快捷方便的多层膜厚度测试方法.

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