首页> 中文期刊> 《西安工业大学学报》 >光学元件面形评价参数的稳定性及关联性

光学元件面形评价参数的稳定性及关联性

         

摘要

为了选取最优评价参数以消除峰谷值(PV)参数出现的敏感性、波动性和不确定性等弊端,文中通过对不同波面的分析和重复性的讨论,对PV、PVm、PV20、PVq和PVr评价参数的稳定性进行分析;对传统抛光加工方式下仅含单项像差的波面和一般波面中 PV 相关评价参数与均方根值(RMS)的关系进行研究.结果表明:PVq和 PVr参数有较好的稳定性.对于仅含单项像差的波面,PV相关参数和RMS的比值均为恒定值,采用单一的参数评价面形质量;对于一般的面形测量,PV相关参数和RMS的比值无确定的关系,采用PV和 RMS参数综合评价光学元件的面形质量.%In order to select the best evaluation parameters to eliminate the sensitivity,volatility, uncertainty of PV parameters,the paper analyzes the stability of PV,PVm,PV20,PVqand PVrbased on the discussion of different wave front and repeatability of the parameters.The relationship between the PV correlation parameters and the RMS in the general wave front and the wavefront with only one aberration is studied.The results show that PVqand PVrhave good stability.For the wavefront with only one aberration,the ratios of PV parameters and the RMS are constant,and the surface quality is evaluated by using one single parameter.For the general surface,there is no definite relationship between the ratios of PV parameters and RMS,and the surface quality is evaluated comprehensively by using both PV and RMS parameters.

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