Synthesis of A Novel Photosensitive Prepolymer with Trimethylolpropane Triglycidylether and Acrylic Acid as Starting Materials

摘要

A novel photosensitive prepolymer of trimethylolpropane triglycidylether triacrylate was synthesized by utilizing trimethylolpropane triglycidylether and acrylic acid as two starting materials, triphenyl phosphine as catalyst and p-hydroxyanisole as inhibitor. The optimum synthesis conditions were that the concentration of triphenyl phosphine was 0.85wt% of reactants, the concentration of p-hydroxyanisole was 0.3wt% of reactants, and the reaction temperature was at 90-110 ℃. Benzil dimethyl ketal of a UV-cured initiator was added to the synthesized trimethylolpropane triglycidylether triacrylate to prepare a kind of UV-cured coating. The mechanical properties of the UV-cured films were determined, giving 28.43 MPa of tensile strength, 965.59MPa of (Young’s) modulus and 4.10% of elongation at tear.