PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD

摘要

A superhard α-Si3N4 film,deposited on metal substrate,was produced by laser chemicalvapor deposition adopting a kW-level high power CO2 laser.Most films are composedof fine Si3N4 partieles.They join the metal substrate in strong bond.The films havesuper hardness,excellent resistance to wear and corrosion,etc.Their thickness may becontrolled within 5-30 μm.