低折射率疏水SiO2薄膜的制备和表征

摘要

为了制备低折射率疏水SiO2薄膜,将正硅酸乙酯(TEOS)和二甲基二乙氧基硅烷(DDS)在碱性条件下共水解缩聚,再以六甲基二氮硅烷(HMDS)做进一步的改性,采用提拉浸渍工艺在玻璃基底上制备单层增透膜.通过对溶胶粘度随老化时间的变化规律及HMDS添加对薄膜接触角影响等的分析与研究,制备了接触角最大的低折射率薄膜;同时对薄膜的红外特性、透过率、折射率进行了表征.结果表明:TEOS和DDS共水解缩聚提高了膜层疏水性,经HMDS改性后,薄膜的接触角为149°,折射率为1.12.%To prepare hydrophobic anti-reflective silica film with low refractive index,sol was first prepared through hydrolysis and condensation of tetraethoxysilane (TEOS) and dimethyldiethoxylsilane (DDS)under ammonia catalysis.The sol was then further modified with hexamethyldisilazane (HMDS),with which one-layer anti-reflective film was preparaed using dip-coating technology on a glass substrate.The rule of viscosity change with aging time and effect of HMDS addition on contact angle were analyzed and investigated,and the film with the largest contact angle and low refractive index was thus obtained.Meanwhile Infrared property,transmittance,refractive index of the film have been characterized.The results showed that the hydrophobicity can be improved by hydrolysis and co-condensation reactions of TEOS and DDS,and the contact angle of the film is 149°and the refractive index is 1.12 after modification.