快速退火技术在磁交换偏置薄膜中的应用及展望

摘要

Rapid thermal annealing (RTA) is widely used in semiconductor fabrication, which can heat sample to high temperature within a short time. In this paper, the development of RTA is reviewed, and the progress and prospect for application on the magnetic thin films are analyzed.%快速退火技术（RTA）可在极短的时间内使器件表面升至高温，该技术被广泛运用在半导体制造领域。综述了RTA的发展历程及其应用于磁性薄膜所取得的进展，并对RTA在磁交换偏置薄膜中的应用前景进行了展望。