液相法在Si基底上沉积非晶碳膜

摘要

液相法以成本低、制备工艺简单等特点成为制备非晶碳膜的热点.然而适合工业化生产的制备工艺参数尚不明确.以Si单晶为基底, 通过液相沉积法在Si表面制备非晶碳膜, 并研究了沉积电压与其摩擦学性能之间的关系.研究结果表明, 在1 800V下所制备的非晶碳膜表面光滑平整、硬度最高.此时非晶碳膜的干摩擦系数最小, 耐磨性最强, 具有良好的摩擦学性能.%The liquid phase method for amorphous carbon films with the features of low-cost and simple process has caused wide public concern.However, suitable process parameters for industrial production are unclear.In the present paper, amorphous carbon film was prepared on the monocrystal silicon surface through liquid-phase method, and relationship between deposition voltage and tribological performance was investigated.The results showed that the amorphous carbon film prepared at 1 800 Vpossessed smoother and denser surface, higher hardness, minimum dry friction coefficient, well abrasion resistance and tribological performance.