SiO_2含量对PI/SiO_2杂化薄膜性能的影响

摘要

聚酰亚胺与SiO2杂化形成的有机-无机杂化薄膜体现出了优异的综合性能,在催化与分离、微电子、光电和绝热材料等领域具有广泛的应用及发展潜力。杂化材料相关的研究也越来越多,就SiO2含量对聚酰亚胺/SiO2杂化薄膜的光、电、热和力学性能的影响进行综述,总结了杂化薄膜的性能随SiO2含量变化而变化的基本规律。%The organic-inorganic hybrid films synthesized from polyimide and inorganic silica have a wide range of applications and development potential in catalysis and separation,microelectronics,photoelectrics and thermal insulation because of their excellent comprehensive properties.And there are more and more investigations on hybrid materials,so in this paper,the influence of SiO2 content on the optics,electronics,mechanics and thermal properties of polyimide/silica hybrid films are summarized,and also the basic rules of their properties changed with different content of SiO2 are summarized.