A discharge-pumped 351 nm XeF(B-X) excimer laser has been developed. For improving output efficiency and energy and achieving stationary discharge, the laser adopted a new switching power supply, compact Chang's electrodes and spark preionization structure, and the optimization of storage/discharge capacitances and working gas mixture was performed. The maximum laser efficiency of the laser is 0.88％. When the laser works at 30 kV with the maximum repetition rate of 80 Hz, the output energy is about 153 raJ/pulse, the average power is 12.9 W, the pulse-to-pulse energy stability is no more than 4％, and the beam dimensions are 7 mm×22 mm near the output window. The laser has been applied to the experiments of the printed circuit board(PCB) lithography system based on resist exposure.%研制了一台实用型放电泵浦的351 nm XeF(B-X)准分子激光器,激光器采用新型开关电源、结构紧凑型张氏电极及放电火花预电离的激光腔结构,通过优化储能电容和放电电容量及比值,选取合理的工作气体压力和配比,优化了激光器性能,提高了激光器输出参数:单脉冲能量153 mJ,平均功率12.9 W,转换效率最高达到0.88%,重复频率1～80 Hz,能量不稳定度小于4%,近场光斑尺寸7 mm×22 mm.激光器已应用到常规抗蚀剂曝光的印刷电路板(PCB)激光投影成像照明系统的实验中.
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