首页> 中文期刊> 《安徽地质》 >High-Performance Photo-Modulated Thin-Film Transistor Based on Quantum dots/Reduced Graphene Oxide Fragment-Decorated ZnO Nanowires

High-Performance Photo-Modulated Thin-Film Transistor Based on Quantum dots/Reduced Graphene Oxide Fragment-Decorated ZnO Nanowires

         

摘要

In this paper, a photo-modulated transistor based on the thin-film transistor structure was fabricated on the flexible substrate by spin-coating and magnetron sputtering. A novel hybrid material that composed of CdSe quantum dots and reduced graphene oxide (RGO) fragment-decorated ZnO nanowires was synthesized to overcome the narrow optical sensitive waveband and enhance the photo-responsivity. Due to the enrichment of the interface and heterostructure by RGO fragments being utilized, the photo-responsivity of the transistor was improved to 2000 A W-1 and the photo-sensitive wavelength was extended from ultraviolet to visible. In addition, a positive back-gate voltage was employed to reduce the Schottky barrier width of RGO fragments and ZnO nanowires. As a result, the amount of carriers was increased by 10 folds via the modulation of back-gate voltage. With these inherent properties, such as integrated circuit capability and wide optical sensitive waveband, the transistor will manifest great potential in the future applications in photodetectors.

著录项

  • 来源
    《安徽地质》 |2016年第3期|247-253|共7页
  • 作者单位

    School of Electronic Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China;

    State Key Laboratory of Precision Measurement Technology and Instruments, Collaborative Innovation Center for Micro/Nano Fabrication, Device and System Department of Precision Instrument, Tsinghua University, Beijing 100084, People’s Republic of China;

    School of Information and Communication Engineering, Beijing University of Posts and Telecommunications, Beijing 100876, People’s Republic of China;

    School of Electronic Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China;

    School of Electronic Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China;

    School of Electronic Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China;

    Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, People’s Republic of China;

    Institute of Semiconductors, Chinese Academy of Science, Beijing 100083, People’s Republic of China;

    School of Electronic Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China;

    School of Electronic Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China;

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