首页> 中文期刊> 《机械工程前沿:英文版》 >Effects of taping on grinding quality of silicon wafers in backgrinding

Effects of taping on grinding quality of silicon wafers in backgrinding

         

摘要

Taping is often used to protect patterned wafers and reduce fragmentation during backgrinding of silicon wafers.Grinding experiments using coarse and fine resinbond diamond grinding wheels were performed on silicon wafers with tapes of different thicknesses to investigate the effects of taping on peak-to-valley(PV),surface roughness,and subsurface damage of silicon wafers after grinding.Results showed that taping in backgrinding could provide effective protection for ground wafers from breakage.However,the PV value,surface roughness,and subsurface damage of silicon wafers with taping deteriorated compared with those without taping although the deterioration extents were very limited.The PV value of silicon wafers with taping decreased with increasing mesh size of the grinding wheel and the final thickness.The surface roughness and subsurface damage of silicon wafers with taping decreased with increasing mesh size of grinding wheel but was not affected by removal thickness.We hope the experimental finding could help fully understand the role of taping in backgrinding.

著录项

  • 来源
    《机械工程前沿:英文版》 |2021年第3期|P.559-569|共11页
  • 作者单位

    Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education Dalian University of Technology Dalian 116024 China;

    Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education Dalian University of Technology Dalian 116024 China;

    Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education Dalian University of Technology Dalian 116024 China;

    Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education Dalian University of Technology Dalian 116024 China;

    CIMS Institute School of Mechanical Engineering Hefei University of Technology Hefei 230009 China;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 半导体技术;
  • 关键词

    taping; silicon wafer; backgrinding; subsurface damage; surface roughness;

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号