高浓度氩气对金刚石膜的质量、晶粒尺寸和硬度的影响

摘要

Micro‐/ nano‐/ ultranano‐crystalline diamond films were prepared respectively by microwave plasma chemical vapor deposition method using Ar/ H2 /CH4 gas mixture . The surface morphologies and crystalline sizes were detected by scanning electron microscopy and X‐ray diffraction , respectively . The quality and residual stress were analyzed by Raman spectroscopy . The micro‐hardness of the file was investigated by reciprocating type friction and wear tester . The results showed that as the Ar concentration increased , the grain size of the films were decreased ; and that the residual tensile stress caused by the shift of Raman G‐peak was increased ; the amorphous carbon phase was increased and the micro‐hardness was decreased .%为研究 Ar 浓度对金刚石膜的质量的影响，采用微波等离子体化学气相沉积法，以 Ar／H2／CH4为气源，通过改变反应气源中的 Ar 流量，在 P 型 Si（100）基片上分别沉积了不同晶粒尺寸的金刚石膜（微米、纳米以及超纳米）。采用扫描电子显微镜、拉曼光谱仪、X 射线衍射仪、往复式摩擦磨损试验机等设备对金刚石薄膜的表面形貌、晶粒尺寸、薄膜质量、残余应力以及微观硬度等特性进行了分析。结果表明：随着 Ar 流量的增加，金刚石膜晶粒尺寸减小；由 G 峰漂移引起的拉应力先减小后增大；薄膜中非金刚石含量增加，硬度下降。