不同沉积气压对 MPCVD 法制备的类金刚石膜性能的影响

摘要

Diamond‐like carbon films were deposited by microwave plasma chemical vapor deposition ( M PCVD) method with glass as the base . Grow th of film was observed under different depositing pressure when ventilating with CH4 and H2 . The light transmittance , the qualities , and surface morphologies were characterized by photometer , Raman spectroscopy and field emission scanning electron microscopy . The results showed that as the deposition pressure increased gradually , visible light transmittance increased step by step , and the size of grain was decreased . In addition , diamond‐like carbon aggregates were smaller and surface roughness became better .%采用微波等离子体化学气相沉积法，以玻璃作为基底，通入 CH4和 H2，在改变沉积气压的条件下研究类金刚石（DLC）薄膜的生长情况。再利用紫外–可见–近红外分光光度计、激光 Raman 光谱仪和场发射扫描电子显微镜分别对制备出的 DLC 薄膜的光透过率、质量以及表面形貌进行表征与分析。结果表明：随着沉积气压的逐渐增大，可见光范围内的光透过率随之增大，类金刚石粒径逐渐减小，膜表面的团聚体尺寸逐渐减小、平整度提高。