纳米金刚石膜真空窗口的制备

摘要

使用自制的微波等离子体化学气相沉积装置,以乙醇为碳源在(100)硅表面制备了金刚石膜；然后用浓硝酸和氢氟酸的混合溶液腐蚀硅,制备出金刚石膜窗口。使用场发射扫描电镜(SEM)、X 射线衍射、拉曼光谱(Raman)、原子力显微镜(AFM)表征和分析金刚石膜,并以自制的漏气率测量系统测量金刚石膜窗口的漏气率。结果表明：金刚石膜的厚度为15μm,平均粗糙度值 Ra 为39.5 nm,晶粒的尺寸大小为30 nm,漏气率为8.8×10%Anew nanocrystalline diamond film is prepared in C2 H6O∕H2 using self-made microwave plasma chemical vapor deposition(MPCVD) system.The nanocrystalline diamond film is deposited on the surface of (100)-oriented Si wafer.Then a nanocrystalline diamond vacuum window is achieved after the silicon wafer is corroded by a mixture of nitric acid and hydrofluoric acid.The morphology, grain size,microstructure,orientation or texture,and crystalline quality of the diamond samples are characterized by scanning electron microscopy (SEM),X-ray diffraction,micro-Raman spectroscopy, and atomic force microscopy (AFM).The final window has a thickness of 15 μm,with surface roughness of Ra 39.5 nm and grain size of 30 nm.According to self-made leakage rate system,the air leakage rate of this vacuum window is 8.8×10 -9 Pa.m3∕s.