Controllable Ultra Low-k by Via-Typed Air Gap with the Better Design Margin for Logic Devices below 45 nm Node

著录项

• 来源
  《中国物理快报：英文版》 |2010年第9期|215-216|共2页
• 作者

  CHOI Youn-Ok; KIM Sang-Yong;

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• 作者单位

  Department of Electrical Engineering Chosun University #375 Seosuk-dong Dong-gu Gwangju 501-759 Republic of Korea;

  Department of Semiconductor System Korea Polytechnic College Ⅳ Cheongju 361-857 Republic of Korea;

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• 原文格式 PDF
• 正文语种 chi
• 中图分类
• 关键词