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Discharge characteristic of very high frequency capacitively coupled argon plasma

         

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  • 来源
    《中国物理:英文版》 |2021年第9期|373-379|共7页
  • 作者单位

    Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province College of Physics and Electronic Engineering Northwest Normal University Lanzhou 730070 China;

    Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province College of Physics and Electronic Engineering Northwest Normal University Lanzhou 730070 China;

    Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province College of Physics and Electronic Engineering Northwest Normal University Lanzhou 730070 China;

    Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province College of Physics and Electronic Engineering Northwest Normal University Lanzhou 730070 China;

    Key Laboratory of Atomic and Molecular Physics & Functional Materials of Gansu Province College of Physics and Electronic Engineering Northwest Normal University Lanzhou 730070 China;

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  • 正文语种 eng
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