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High energy electron radiation effect on Ni/4H-SiC SBD and Ohmic contact

机译:高能电子辐射对Ni / 4H-SiC SBD和欧姆接触的影响

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摘要

The Ni/4H-SiC Schottky barrier diodes (SBDs) and transfer length method (TLM) test patterns of Ni/4H-SiC Ohmic contacts were fabricated,and irradiated with 1 MeV electrons up to a dose of 3.43×1014 e/cm-2.After radiation,the forward currents of the SBDs at 2 V decreased by about 50%,and the reverse currents at -200 V increased by less than 30%.Schottky barrier height (φB) of the Ni/4H-SiC SBD increased from 1.20 eV to 1.21 eV under 0 V irradiation bias,and decreased from 1.25 eV to 1.19 eV under -30 V irradiation bias.The degradation of φB could be explained by the variation of interface states of Schottky contacts.The on-state resistance (Rs) and the reverse current increased with the dose,which can be ascribed to the radiation defects in bulk material.The specific contact resistance (ρc) of
机译:制作了Ni / 4H-SiC欧姆接触的Ni / 4H-SiC肖特基势垒二极管(SBD)和传输长度方法(TLM)测试图,并用1 MeV电子辐照,辐射剂量为3.43×1014 e / cm- 2,辐射后,2V时SBD的正向电流下降约50%,-200V时反向电流增加不到30%.Ni / 4H-SiC SBD的肖特基势垒高度(φB)增大在0 V辐照偏压下从1.20 eV降至1.21 eV,而在-30 V辐照偏压下从1.25 eV降至1.19 eV。 Rs)和反向电流随剂量增加而增加,这可以归因于散装材料中的辐射缺陷。

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  • 来源
    《中国物理:英文版》 |2009年第8期|3490-3494|共5页
  • 作者单位

    School of Microelectronies and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China;

    School of Microelectronies and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China;

    School of Microelectronies and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China;

    School of Microelectronies and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China;

    School of Microelectronies and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 物理学;
  • 关键词

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