The （200） dominated （Nd∶LuVO4） films were fabricated successfully on polished SiO2 under different ambient gases and different oxygen pressures. By XRD, it is shown that a film with good crystallization is deposited under oxygen and the optimal pressure is 20 Pa. The surface morphology of （Nd∶LuVO4） films was observed by AFM, and it is found that oxygen pressure influences the surface morphology of （Nd∶LuVO4） films. The ratio of content of （Nd∶LuVO4） films was estimated according to the yields of Lu and V by using RBS spectra, this ratio is in good agreement with the target composition. The effective index refractive of every mode is 2.0044, 17098, measured by prism coupler method.
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