首页> 中文期刊> 《发光学报》 >Zn、Cu 共掺杂 TiO2∶SiO2薄膜材料的光学性能研究

Zn、Cu 共掺杂 TiO2∶SiO2薄膜材料的光学性能研究

         

摘要

By using sol-gel method, Zn and Cu co-doped TiO2∶ SiO2 gel was prepared and coated on glass substrates by spin coating method. Under the same experimental conditions, the effects of the different doped proportion of Zn and Cu, calcined temperature and time on the structure, morpholo-gy and property of Zn and Cu co-doped TiO2∶ SiO2 films were discussed. By using XRD, FESEM, FTIR etc. , the films were characterized and the photocatalytic degradation performances on methyl orange were researched. XRD patterns demonstrate that the films are anatase structure and have high crystallization. SEM images show that the film surface has no crack and its particles have small size. UV-Vis absorption spectra indicate that the absorbance of the film is very high in the visible and ul-traviolet region. The degradation experiments under UV light illustrate that the photocatalysis degra-dation efficiency of the film on methyl orange increases greatly compare with pure TiO2 film. The degradation rate reaches the highest for the film with the molar ratio of n( Ti) ∶ n( Si) ∶ n( Zn) ∶n(Cu) = 3 ∶ 2 ∶ 1. 5 ∶ 4 calcined at 600 ℃ for 2 h.%用溶胶-凝胶法制得 Zn、Cu 共掺杂的 TiO2∶ SiO2凝胶,旋转法于玻璃基底涂膜,制得 Zn、Cu 共掺杂的TiO2∶ SiO2薄膜,探讨了煅烧温度、煅烧时间及掺杂比例对其结构、形貌和性能的影响。采用 XRD、FESEM、FT-IR 等测试技术对薄膜进行表征,并考察了其对甲基橙的光催化降解性能。 XRD 测试结果显示:薄膜样品的晶型为锐钛矿型,结晶良好。 SEM 谱图显示:薄膜微粒粒径小,分布均匀,表面平整、致密且无明显裂痕;紫外-可见光谱(UV-Vis)表明:Zn、Cu 共掺杂的 TiO2∶ SiO2薄膜在紫外区和可见光区的吸光度明显增加,提高了对光的利用率;光催化性能测试表明:与纯相 TiO2对比,Zn、Cu 共掺杂的 TiO2∶ SiO2薄膜对甲基橙的光催化降解率有较大提高,在600℃下焙烧2 h 的掺杂的量比为 n(Ti)∶ n(Si)∶ n(Zn)∶ n(Cu)=3∶2∶1.5∶4的薄膜样品光催化降解率最高。

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