首页> 中文期刊> 《原子能科学技术》 >乙醇为碳源的低氢常压CVD法制备石墨烯薄膜及其生长机理研究

乙醇为碳源的低氢常压CVD法制备石墨烯薄膜及其生长机理研究

         

摘要

The graphene was successfully synthesized by chemical vapor deposition method using ethanol as carbon source at low hydrogen concentration and atmospheric pressure .T he results of SEM ,Raman ,T EM and selected area electron diffraction show that the graphene has well‐structure and high‐quality .In order to analyze the mecha‐nism , the experiments were designed to obtain the morphology during graphene grow th .It turns out that carbon atoms originating from the thermolysis of ethanol gath‐er and nucleate on copper surface .The initial grain develops from island domain to den‐dritic structure .During the process of grow th , these dendrites can span the surface boundaries of copper until forming intact graphene .%以乙醇为碳源,采用低氢常压化学气相沉积(CVD )法在铜基底上制备石墨烯薄膜,并将其成功转移至目标基底。通过SEM、Raman、TEM、选区电子衍射等分析发现,所制备的石墨烯薄膜结构完整、质量良好。通过设计实验,观察和分析了石墨烯薄膜生长过程中主要阶段的形貌特征及生长机理。结果表明,乙醇高温分解出的碳原子在铜基底表面聚集形核,形成的原始晶粒逐渐长大为岛状晶畴直至形成树枝状薄片,并在生长过程中跨越铜基底表面晶界,最后形成完整的石墨烯薄膜。

著录项

相似文献

  • 中文文献
  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号