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Study of Metal Catalysts Supported on Thin Films of Perovskites Prepared by Atomic Layer Deposition (ALD)

机译：用原子层沉积（ALD）制备的钙钛矿薄膜金属催化剂的研究

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作者
Mao, Xinyu.;
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作者单位

University of Pennsylvania.;

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授予单位 University of Pennsylvania.;
学科
学位 Ph.D.
年度 2021
页码 202 p.
总页数 202
原文格式 PDF
正文语种 eng
中图分类
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专利

1. Preliminary Studies in the Electrodeposition of PbSe/PbTe Superlattice Thin Films via Electrochemical Atomic Layer Deposition (ALD) [J] . Raman Vaidyanathan, Steven M.Cox, Uwe Happek Langmuir: The ACS Journal of Surfaces and Colloids . 2006,第25期

机译：通过电化学原子层沉积（ALD）电沉积PbSe / PbTe超晶格薄膜的初步研究
2. Preliminary Studies in the Electrodeposition of PbSe/PbTe Superlattice Thin Films via Electrochemical Atomic Layer Deposition (ALD) [J] . Raman Vaidyanathan, Steven M.Cox, Uwe Happek Langmuir: The ACS Journal of Surfaces and Colloids . 2006,第25期

机译：通过电化学原子层沉积（ALD）电沉积PbSe / PbTe超晶格薄膜的初步研究
3. Adsorption and desorption of toluene on nanoporous TiO2/SiO2 prepared by atomic layer deposition (ALD): influence of TiO2 thin film thickness and humidity [J] . Hyun Ook Seo, Dae Han Kim, Kwang-Dae Kim Adsorption . 2013,第6期

机译：原子层沉积（ALD）制备的纳米多孔TiO2 / SiO2上甲苯的吸附和解吸：TiO2薄膜厚度和湿度的影响
4. MICROSTRUCTURAL AND ELECTRICAL PROPERTIES OF GADOLINIUM DOPED CERIA THIN FILMS PREPARED BY ATOMIC LAYER DEPOSITION (ALD) [C] . E. Gourba, A. Ringuede, M. Cassir, International Symposium on Solid Oxide Fuel Cells(SOFC VIII); 20030427-20030502; Paris; FR . 2003

机译：原子层沉积（ALD）制备的掺铈铈薄膜的微观结构和电学性质
5. Molecular engineering for thin-film applications: Area-selective atomic layer deposition (ALD) and molecular-atomic layer deposition (MALD). [D] . Huang, Jie. 2014

机译：薄膜应用的分子工程：区域选择性原子层沉积（ALD）和分子原子层沉积（MALD）。
6. Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode [O] . Mohd Zahid Ansari, Nazish Parveen, Dip K. Nandi, -1

机译：通过在3D金属支架上通过原子层沉积（ALD）制备的高性能共形层状硫化锡（SnSx）对高性能超级电容器电极的活性增强
7. Gas sensing properties of very thin TiO2 films prepared by atomic layer deposition (ALD) [O] . Boyadjiev S., Georgieva V., Vergov L., 2014

机译：通过原子层沉积（ALD）制备的非常薄的TiO2薄膜的气敏特性
8. Surface Acidity and Properties of TiO2/SiO2 Catalysts Prepared by Atomic Layer Deposition: UV-visible Diffuse Reflectance, DRIFTS, and Visible Raman Spectroscopy Studies [R] . Lu, J, Kosuda, K M, Van Duyne, RP, 2009

机译：原子层沉积法制备TiO2 / siO2催化剂的表面酸性和性质：紫外 - 可见漫反射，DRIFTs和可见拉曼光谱研究

Study of Metal Catalysts Supported on Thin Films of Perovskites Prepared by Atomic Layer Deposition (ALD)

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