A new photoresist for MEMS and BioMEMS applications.

摘要

Photoresist plays an important role in microfabrication. There are many photoresists in use for a variety of present applications such as: electroplating, electroforming, microelectrical mechanical systems (MEMS), and even biological MEMS. However, there are many limitations for processing and usage due to intrinsic material properties, especially for multi layer devices and biological applications. In this study, a novel photopatternable 1002F and its properties has been intensively investigated for its applications in MEMS and BioMEMS. The use of 1002F as structure material, sacrificial layer, beam material, microfluidics channel material, physical transferable carriers has been demonstrated. The properties such as easy to remove, flexible, good adhesion, biocompatible and low autofluorescence make 1002F become a very high potential material for widespread applications. Relative to SU-8, 1002F photoresist offers substantial improvements as a substrate in MEMS and BioMEMS devices and is likely to find more applications.