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Characterization of electrostatic potential of compound semiconductors using off-axis electron holography.

机译:使用离轴电子全息图表征化合物半导体的静电势。

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摘要

The research of this dissertation involved the use of off-axis electron holography to investigate electrostatic potentials within AlGaAs/GaAs heterostructures. The inelastic mean-free-paths of high-energy electrons (200 keV) for AlAs and GaAs have been determined to be 77 nm and 67 nm, respectively, based on comparing thicknesses by electron holography and convergent beam electron diffraction. The mean inner potentials of AlAs and GaAs were determined to be 12.1 V and 14.0 V, respectively. Accurate knowledge of these parameters was essential before commencing potential profiling across AlGaAs/GaAs heterojunction devices.;The electrostatic potential profiles across AlGaAs/AlAs/GaAs heterostructures containing n- and p-doped AlGaAs layers were measured. Potential drops of 0.5 V, caused by ionized carbon impurities, were observed at the epilayer/substrate interface of both heterostructures. The measured potential profiles in the region of the buffer/substrate interface were simulated by adding a sheet acceptor layer at the buffer/substrate interface. The additional interface impurities pull the conduction band up at the interface relative to the Fermi level.;The heavily doped p-n junctions in AlGaAs light-emitting diodes with triangular barriers were investigated with emphasis on the efficiency of dopant activation. Comparison of experimental and simulated p-n junction potential profiles enabled the Si and Be dopant activation to be determined. The low Si activation efficiency of 12 percent at 0.6 Al was attributed to the crossover of gamma and X conduction-band minima near the concentration of 0.43 Al. Simulated band-edge diagrams with nominal and activated dopants showed the effect of AlGaAs barrier shape on carrier transport. The lightly doped p-n junctions in InGaAs light-emitting diodes with linearly graded barriers were also studied, and the effect of unintentional oxygen impurities was investigated in terms of doping efficiency.;Overall, the success of these studies has verified the capability of off-axis electron holography to provide unique information about complex heterostructures of compound semiconductors with nanoscale resolution. The technique should become a useful tool for future device development and process optimization.
机译:本论文的研究涉及利用离轴电子全息技术研究AlGaAs / GaAs异质结构内部的静电势。基于电子全息图和会聚束电子衍射的厚度比较,AlAs和GaAs的高能电子(200 keV)的非弹性平均自由程分别确定为77 nm和67 nm。 AlAs和GaAs的平均内部电势分别确定为12.1 V和14.0V。在开始跨AlGaAs / GaAs异质结器件进行电势分析之前,对这些参数的准确了解是必不可少的。;测量了包含n和p掺杂的AlGaAs层的AlGaAs / AlAs / GaAs异质结构上的静电势分布。在两个异质结构的外延层/衬底界面处观察到由电离的碳杂质引起的0.5 V电位降。通过在缓冲器/基板界面处添加薄板受体层,来模拟在缓冲器/基板界面区域中测得的电位分布。额外的界面杂质使界面处的导带相对于费米能级向上拉。;研究了具有三角势垒的AlGaAs发光二极管中的重掺杂p-n结,着重于掺杂剂激活的效率。比较实验和模拟的p-n结电势曲线可以确定Si和Be掺杂物的活化。在0.6 Al下,Si活化效率低至12%,这是由于在0.43 Al浓度附近,γ和X导带最小值的交叉所致。具有标称和活化掺杂剂的模拟带边图显示了AlGaAs势垒形状对载流子传输的影响。还研究了具有线性渐变势垒的InGaAs发光二极管中的轻掺杂pn结,并从掺杂效率的角度研究了无意中的氧杂质的影响。总体而言,这些研究的成功证明了离轴能力电子全息技术可提供有关具有纳米级分辨率的化合物半导体复杂异质结构的独特信息。该技术应成为将来设备开发和过程优化的有用工具。

著录项

  • 作者

    Chung, Suk.;

  • 作者单位

    Arizona State University.;

  • 授予单位 Arizona State University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 112 p.
  • 总页数 112
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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