首页> 外文学位 >THE EFFECTS OF NONUNIFORMITY ON THE MODELING OF RESISTIVITY IN POLYCRYSTALLINE SILICON THIN FILMS (POLYSILICON, GRAIN BOUNDARY, DISTRIBUTION FUNCTION, DOPING PROFILE, TEM).
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THE EFFECTS OF NONUNIFORMITY ON THE MODELING OF RESISTIVITY IN POLYCRYSTALLINE SILICON THIN FILMS (POLYSILICON, GRAIN BOUNDARY, DISTRIBUTION FUNCTION, DOPING PROFILE, TEM).

机译:非均匀性对多晶硅硅薄膜(多晶硅,晶界,分布函数,掺杂曲线,TEM)中电阻率建模的影响。

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摘要

This research is concerned with the electrical and transport properties in the Low Pressure Chemical Vapor Deposited (LPCVD) polycrystalline silicon thin film resistors. There are currently many uses of polysilicon in the integrated circuit industry, but these uses are constrained by the lack of control over the electrical properties of this material. This problem is a direct result of the nonuniformity in the physical nature of this material. Current models of the electronic properties involve detailed analysis of the abstract conduction mechanisms while ignoring the more realistic aspects of the observed characteristics. This research attempts to provide a new theory of practical use for the modelling of the characteristics of this material. The theory developed by this study explicitly models the nonuniform characteristics by the use of distribution functions. The model is also applied to characterize the experimental results of the electrical properties of variously processed LPCVD polysilicon. The study also develops a procedure for the determination of the location of the charge subsets by extraction from experimental results. Included in the study is an investigation of the microstructure by Transmission Electron Microscope.; The theory developed by this investigation is applied to the evaluation of the resistivity function of temperature for polycrystalline silicon thin film material. The derived function includes the effects of the variation in grain boundary barrier heights, the grain boundary surface to volume ratio, a carrier density which is constant with temperature and the thermionic emission conduction mechanism. Also, the calculation of the amount of charge trapped at the grain boundaries is modified to include the effect of a dopant profile near the grain boundary. All parameters in the model are constants with temperature and are determined from experiment.
机译:这项研究与低压化学气相沉积(LPCVD)多晶硅薄膜电阻器的电学和传输性能有关。多晶硅在集成电路工业中目前有许多用途,但是由于对这种材料的电性能缺乏控制而限制了这些用途。该问题是该材料的物理性质不均匀的直接结果。当前的电子特性模型涉及对抽象传导机制的详细分析,而忽略了所观察到的特性的更为现实的方面。这项研究试图为这种材料的特性建模提供一种新的实用理论。这项研究开发的理论通过使用分布函数明确地对非均匀特征进行建模。该模型还用于表征经过各种处理的LPCVD多晶硅的电性能的实验结果。该研究还开发了一种通过从实验结果中提取来确定电荷子集位置的方法。该研究包括通过透射电子显微镜对微观结构的研究。通过该研究开发的理论被用于多晶硅薄膜材料的温度电阻率函数的评估。导出的函数包括晶界势垒高度变化,晶界表面与体积之比,随温度变化的载流子密度以及热电子发射传导机理的影响。而且,修改了在晶界处捕获的电荷量的计算以包括晶界附近的掺杂剂分布的影响。模型中的所有参数都是温度常数,由实验确定。

著录项

  • 作者

    KRULL, WADE ALLEN.;

  • 作者单位

    University of Florida.;

  • 授予单位 University of Florida.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1985
  • 页码 152 p.
  • 总页数 152
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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