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In situ determination of thermal profiles during Czochralski silicon crystal growth by an eddy current technique.

机译:通过涡流技术原位确定切克劳斯基硅晶体生长过程中的热分布。

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摘要

An eddy current testing method was developed to continuously monitor crystal growth process and determine thermal profiles in situ during Czochralski silicon crystal growth. The work was motivated by the need to improve the quality of the crystal by controlling thermal gradients and annealing history over the growth cycle. The experimental concept is to monitor intrinsic electrical conductivities of the growing crystal and deduce temperature values from them. The experiments were performed in a resistance-heated Czochralski puller with a 203 mm (8 inch) diameter crucible containing 6.5 kg melt. The silicon crystals being grown were about 80 mm in diameter and monitored by an encircling sensor operating at three different test frequencies (86, 53 and 19 kHz). A one-dimensional analytical solution was employed to translate the detected signals into electrical conductivities. In terms of experiments, the effects of changes in growth condition, which is defined by crystal and crucible rotation rates, crucible position, pull rate, and hot-zone configuration, were investigated. Under a given steady-state condition, the thermal profile was usually stable over the entire length of crystal growth. The profile shifted significantly, however, when the crucible rotation rate was kept too high. As a direct evidence to the effects of melt flow on heat transfer process, a thermal gradient minimum was observed about the crystal/crucible rotation combination of 20/{dollar}-{dollar}10 rpm cw. The thermal gradient reduction was still most pronounced when the pull rate or the radiant heat loss to the environment was decreased: a nearly flat axial thermal gradient was achieved when either the pull rate was halved or the height of the exposed crucible wall was effectively doubled. Under these conditions, the average axial thermal gradient along the surface of the crystal was about 4-5 {dollar}sp{lcub}rm o{rcub}{dollar}C/mm. Regardless of growth condition, the three-frequency data revealed radial thermal gradients much larger than what were predicted by existing theoretical models. This discrepancy seems to indicate that optical effects, which are neglected in theoretical modeling, play a major role in the internal heat transfer of the crystal.
机译:开发了一种涡流测试方法来连续监测晶体生长过程并确定直拉硅晶体生长过程中的热分布。需要通过在整个生长周期内控制热梯度和退火历史来提高晶体质量来推动这项工作。实验概念是监视正在生长的晶体的固有电导率并从中推导出温度值。实验在电阻加热的切克劳斯基拉拔器中进行,该拉拔器装有203毫米(8英寸)直径的坩埚,内含6.5千克熔体。所生长的硅晶体直径约为80毫米,并由以三个不同测试频率(86、53和19 kHz)运行的环绕传感器进行监控。使用一维分析解决方案将检测到的信号转换为电导率。在实验方面,研究了生长条件变化的影响,生长条件的变化由晶体和坩埚旋转速度,坩埚位置,拉速和热区构型定义。在给定的稳态条件下,热分布通常在晶体生长的整个长度上都是稳定的。但是,当坩埚旋转速度保持过高时,轮廓会明显变化。作为熔体流动对传热过程影响的直接证据,在晶体/坩埚旋转组合20 / {dollar}-{dollar} 10 rpm cw处观察到最小的热梯度。当降低拉速或降低对环境的辐射热时,热梯度的降低仍然最为明显:当拉速减半或有效地使暴露的坩埚壁的高度加倍时,可获得接近平坦的轴向热梯度。在这些条件下,沿晶体表面的平均轴向热梯度为约4-5C / mm。无论生长条件如何,三频数据都显示出径向热梯度远大于现有理论模型所预测的径向热梯度。这种差异似乎表明,在理论建模中被忽略的光学效应在晶体内部的热传递中起着重要作用。

著录项

  • 作者

    Choe, Kwang Su.;

  • 作者单位

    Columbia University.;

  • 授予单位 Columbia University.;
  • 学科 Engineering Materials Science.; Engineering Mechanical.; Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 1989
  • 页码 150 p.
  • 总页数 150
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;机械、仪表工业;
  • 关键词

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