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High-performance subthreshold standard cell design and cell placement optimization.

机译:高性能亚阈值标准电池设计和电池放置优化。

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摘要

Digital subthreshold Complementary Metal-Oxide-Semiconductor (CMOS) circuits are gaining importance because of their ability to serve as an ideal low-power solution. Sub-threshold circuits can potentially replace superthreshold circuits in portable devices which execute non-performance-critical tasks, thereby increasing the battery life. The drawback of subthreshold circuits is their low operating speeds. By enhancing the speed of subthreshold circuits their application spectrum can be expanded.;Operating frequency is primarily dependent on the ON current (Ion) of the transistor. Increasing Ion would improve the frequency of subthreshold circuits. Ion is dependent on various parameters such as transistor threshold voltage (Vth), gate-source voltage ( Vgs) and supply voltage (Vdd). Ion can be increased either by boosting the V gs or by lowering the Vth of the MOS transistors through substrate biasing. This thesis presents a new approach to substrate biasing and compares the results with two existing biasing techniques. A new performance enhancement technique using charge boosting buffers to boost the Vgs of the transistors is presented. A performance-enhanced subthreshold standard cell library was built by implementing these techniques on a regular cell library for IBM 65 nm technology. The performance-enhanced cell library when implemented on the ISCAS benchmark circuits yielded a 10 times improvement in the frequency with approximately 2 times increase in the energy-delay product (EDP). The optimization problem for minimizing the overhead in the energy consumption without affecting the frequency is formulated as an integer linear program (ILP). The optimization algorithm yielded a 50% reduction in the EDP.
机译:数字亚阈值互补金属氧化物半导体(CMOS)电路由于能够用作理想的低功耗解决方案而变得越来越重要。亚阈值电路有可能取代执行非性能关键任务的便携式设备中的超阈值电路,从而延长电池寿命。亚阈值电路的缺点是运行速度低。通过提高亚阈值电路的速度,可以扩展其应用范围。工作频率主要取决于晶体管的导通电流(Ion)。增加离子将改善亚阈值电路的频率。离子取决于各种参数,例如晶体管阈值电压(Vth),栅源电压(Vgs)和电源电压(Vdd)。可以通过提高V gs或通过衬底偏置降低MOS晶体管的Vth来增加离子。本文提出了一种新的衬底偏置方法,并将结果与​​两种现有的偏置技术进行了比较。提出了一种新的性能增强技术,该技术使用电荷增强缓冲器来增强晶体管的Vgs。通过在用于IBM 65 nm技术的常规单元库上实施这些技术,构建了性能增强的亚阈值标准单元库。当在ISCAS基准电路上实现性能增强的单元库时,其频率提高了10倍,而能量延迟乘积(EDP)则提高了约2倍。用于最小化能量消耗的开销而不影响频率的优化问题被表述为整数线性程序(ILP)。优化算法使EDP降低了50%。

著录项

  • 作者

    Amarchinta, Sumanth.;

  • 作者单位

    Rochester Institute of Technology.;

  • 授予单位 Rochester Institute of Technology.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 M.S.
  • 年度 2009
  • 页码 134 p.
  • 总页数 134
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 公共建筑;
  • 关键词

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