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Optical properties of silicon(1-x) germanium(x)/silicon quantum wells and superlattices for device applications.

机译:硅(1-x)锗(x)/硅量子阱和超晶格的光学特性,用于设备应用。

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Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si heterostructures have received considerable interest in recent years because of their novel optical and high speed device applications. The major advantage of the Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si material system is its compatibility with the current Si-VLSI technology. Fabrication of novel optical devices (infrared detectors, lasers and optical modulators) will make a great impact on optoelectronics, since these devices can be monolithically integrated with Si-VLSI circuits. Motivated by this, optical properties of Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si quantum wells and superlattices have been investigated in this dissertation. The samples used in the experiments have been grown by the Si/Ge molecular beam epitaxy (MBE) technique.; This dissertation consists of four main subjects which reveal the optical properties of Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si quantum wells, superlattices and Si {dollar}delta{dollar}-doped quantum wells, and discuss the realization of novel optical devices using Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si structures. In chapters 4 through 6 the experimental results of the intersubband transitions will be discussed. The incoming photon polarization field dependent absorption spectra are in good agreement with the intersubband transition selection rule. The heavy doping effects on the intersubband absorption, especially peak transition energy, are quantitatively investigated by employing the self-consistent calculation which incorporates many-body effects. Intersubband transitions between minibands in Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si superlattices are also observed. In this case, carriers are externally injected to minibands at the resonant condition.; Using p-type Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si multiple quantum wells, long wavelength ({dollar}{lcub}sim{rcub}10 mu{dollar}m) infrared detectors are fabricated. These detectors exhibit normal incidence detection. The measured peak responsivity is about 0.3 A/W at 77 K, and estimated detectivity ({dollar}Dsp*{dollar}) is about 1.0 {dollar}times{dollar} 10{dollar}sp9{dollar} cm {dollar}sqrt{lcub}rm Hz{rcub}{dollar}/W for 7 {dollar}sim{dollar} 10 {dollar}mu{dollar}m at 77 K. The performance of the detector and the physics involved in the normal incidence detection will be discussed in chapter 7.; In chapter 8, the first observation of normal incidence intervalence-subband infrared transition in p-type Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si multiple quantum wells will be discussed. The transition energy and the peak absorption strength are shown to be a strong function of the Ge concentration in the well. The physics of this transition will be discussed. Also, based on this infrared transition, other normal incidence infrared detectors have been fabricated. The measured photoresponse will also be presented.; Finally, in chapter 9, the first observation of large interband Stark shift in type-II Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si multiple quantum wells will be discussed. The results show large red shift of the absorption edge which is about 0.7 {dollar}sim{dollar} 1 meV kV{dollar}sp{lcub}-1{rcub}{dollar} cm. This suggests the application of type-II Si{dollar}sb{lcub}rm 1-x{rcub}{dollar}Ge{dollar}sb{lcub}rm x{rcub}{dollar}/Si structures for the electro-optics devices near 1.3 {dollar}mu{dollar}m.
机译:Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si异质结构近年来因其新颖的光学和光学特性而受到广泛关注。高速设备应用。 Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si材料系统的主要优点是它与当前的Si兼容-VLSI技术。新型光学器件(红外检测器,激光器和光学调制器)的制造将对光电子产生重大影响,因为这些器件可以与Si-VLSI电路单片集成。因此,研究了Si {dollar} sb {lcub} rm 1-x {rcub} {dol} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si量子阱和超晶格的光学性质在这篇论文中。实验中使用的样品已经通过Si / Ge分子束外延(MBE)技术生长。本论文由四个主要主题组成,揭示了Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si量子的光学性质阱,超晶格和掺有Si {dollar} delta {dollar}的量子阱,并讨论了使用Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb { lcub} rm x {rcub} {dollar} / Si结构。在第4章到第6章中,将讨论子带间转换的实验结果。入射光子偏振场相关的吸收光谱与子带间跃迁选择规则非常一致。通过采用包含多体效应的自洽计算,定量研究了重掺杂对子带间吸收的影响,尤其是峰值跃迁能量。还观察到Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si超晶格之间的小带间跃迁。在这种情况下,在谐振条件下将载波从外部注入到微带。使用p型Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si多量子阱,长波长({dollar}制造了10μm的红外检测器。这些检测器表现出法向入射检测。在77 K时,测得的峰值响应度约为0.3 A / W,估计的探测灵敏度({DOL} DSP * {DOLLAR})约为1.0 {USDR} {{USDR}} 10 {USDR} SP9 {USDOL} cm {USDOL} sqrt在77 K时,{lcub} rm Hz {rcub} {dollar} / W为7 {dollar} sim {dollar} 10 {dollar} mu {dollar} m。探测器的性能和法向入射探测所涉及的物理学将在第7章中讨论。在第8章中,对p型Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub}的垂直入射间隔-子带红外跃迁的首次观察将讨论多个量子阱。过渡能量和峰值吸收强度显示出是阱中Ge浓度的强函数。将讨论这种过渡的物理过程。而且,基于该红外跃迁,已经制造了其他法向入射红外检测器。还将显示测得的光响应。最后,在第9章中,对II型Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {将讨论美元/ Si多量子阱。结果显示吸收边缘的大红移大约为0.7 {dollar} sim {dollar} 1 meV kV {dollar} sp {lcub} -1 {rcub} {dollar} cm。这表明II型Si {dollar} sb {lcub} rm 1-x {rcub} {dollar} Ge {dollar} sb {lcub} rm x {rcub} {dollar} / Si结构在电光中的应用设备在1.3 {dollar} mu {dollar} m附近。

著录项

  • 作者

    Park, Jin Suk.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Physics Condensed Matter.; Engineering Electronics and Electrical.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1992
  • 页码 220 p.
  • 总页数 220
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;工程材料学;
  • 关键词

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