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Double-doped double-strained modulation-doped field effect transistor: 3D-SMODFET.

机译:双掺杂双应变调制掺杂场效应晶体管:3D-SMODFET。

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摘要

This dissertation reviews the operation of MODFETs and the current status they have achieved as the world's fastest transistor. The utilization of AlGaAs/InGaAs heterostructures in the MODFET has resulted in the wide spread use of PHEMTs in the microwave industry today. This structure's increasing popularity is mainly due to the improvement in the quality and price of GaAs substrates over the past ten years. As the cost of good semi-insulating GaAs substrates has dropped, economic forces and the industries' need for microwave applications (wireless market) have driven the PHEMT into the production line of many companies world wide. The cost advantages of monolithic integration has results in the wide spread applications of monolithic microwave integrated circuits (MMIC). The advantages of the AlInAs/InGaAs heterostructure are numerous and will be discussed in detail within this dissertation. The simple fact of this is the continued research in using the AlInAs/InGaAs heterostructure on GaAs substrates with the inherent problems of the large lattice mismatch.;Results of this careful optimization of the AlInAs/InGaAs MODFET on InP substrates are an exceptional industry record high 2DEG sheet charge of ;In this dissertation the careful optimization of the AlInAs/InGaAs heterostructure for use in MODFET structures is done. In reviewing epitaxial designs for AlInAs/InGaAs heterostructures it became clear that the common InP-based MODFET was not optimized. This conclusion is based on the fact when comparing the AlInAs/InGaAs MODFET to the AlGaAs/InGaAs PHEMT they received a lot of bang for the buck. The large conduction band discontinuity (
机译:本文回顾了MODFET的工作原理以及它们作为世界上最快的晶体管所获得的当前状态。 MODFET中AlGaAs / InGaAs异质结构的使用已导致PHEMT在当今的微波行业中得到了广泛的应用。这种结构的日益普及主要是由于过去十年中GaAs衬底的质量和价格的提高。随着优质半绝缘GaAs衬底的成本下降,经济力量和行业对微波应用的需求(无线市场)将PHEMT推向了全球许多公司的生产线。单片集成的成本优势已导致单片微波集成电路(MMIC)的广泛应用。 AlInAs / InGaAs异质结构的优点是很多的,本文将对此进行详细讨论。一个简单的事实是继续研究在GaAs衬底上使用AlInAs / InGaAs异质结构存在固有的大晶格失配问题。 2DEG薄层电荷;本文对用于MODFET结构的AlInAs / InGaAs异质结构进行了仔细的优化。在审查AlInAs / InGaAs异质结构的外延设计时,很明显,常见的基于InP的MODFET没有得到优化。该结论基于以下事实:将AlInAs / InGaAs MODFET与AlGaAs / InGaAs PHEMT进行比较时,他们获得了很多回报。大的导带不连续性(

著录项

  • 作者

    Martin, Glenn Harvey.;

  • 作者单位

    Cornell University.;

  • 授予单位 Cornell University.;
  • 学科 Engineering Electronics and Electrical.;Physics Condensed Matter.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1997
  • 页码 145 p.
  • 总页数 145
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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