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Epitaxial structure dependence of gain, refractive index, and linewidth enhancement factor in gallium arsenide and indium gallium arsenide broad-area quantum well lasers.

机译:砷化镓和砷化铟镓广域量子阱激光器中增益,折射率和线宽增强因子的外延结构依赖性。

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摘要

Semiconductor lasers have taken a prominent position in the present technological areas of optoelectronics, optical communications, spectroscopy, laser pumping, and numerous other fields. Filamentation tendencies and spatial coherence of high-power semiconductor lasers are strongly influenced by the linewidth enhancement factor or alpha parameter. The alpha parameter is also a critical factor controlling the linewidth and modulation characteristics of high frequency diode lasers. This investigation centers on the epitaxial dependence of the alpha parameter with the goal of finding ways to reduce it and thus increase the output powers of broad-area devices and improve their beam quality.; In this study, experimental and theoretical results for gain, refractive index change, and linewidth enhancement factor in four broad-area quantum well lasers are reported, analyzed, and discussed. Two of the laser structures have GaAs quantum well layers that vary in width, and the other two have InGaAs quantum well layers that vary in quantum well depth. Experimental data from the Hakki-Paoli method are used to compare gain, index change, and alpha parameter between these pairs of devices.; Also, the results of two computer models for the structures are compared to the experimental data and to each other. The first is based on the approximation of parabolic bands for both the conduction and valence bands, and the second employs the k·p method to calculate the valence bands. The findings include the following: (1) narrower and deeper quantum wells yield lower alpha values; (2) modeling results from the k·p method agree somewhat better, but not greatly, with the experimental data than the results from the parabolic band model; (3) stimulated emission below threshold has been found to be prominent in these devices; (4) carriers in the barrier energy states above the well are shown to be responsible for high alpha values. Finally, a description is presented for a method to reduce alpha to nearly zero by using an absorbing quantum well coupled with an emitting one in the same epitaxy of a semiconductor laser device.
机译:半导体激光器在光电子,光通信,光谱学,激光泵浦和许多其他领域的当前技术领域中已占据突出地位。高功率半导体激光器的细丝化趋势和空间相干性受到线宽增强因子或alpha参数的强烈影响。 alpha参数也是控制高频二极管激光器的线宽和调制特性的关键因素。这项研究集中在外延对阿尔法参数的依赖性上,目的是找到减少它的方法,从而增加广域设备的输出功率并改善其光束质量。在这项研究中,报告,分析和讨论了四种广域量子阱激光器中增益,折射率变化和线宽增强因子的实验和理论结果。其中两个激光器结构具有宽度变化的GaAs量子阱层,另外两个激光器结构具有量子阱深度变化的InGaAs量子阱层。 Hakki-Paoli方法的实验数据用于比较这两对设备之间的增益,折射率变化和alpha参数。另外,将两个计算机模型的结构结果与实验数据进行了比较。第一种基于导带和价带的抛物线带的近似,第二种采用k·p方法计算价带。研究结果包括:(1)量子阱越窄越深,α值越低; (2)与抛物线带模型的结果相比,k·p方法的建模结果与实验数据的吻合度稍好,但差异不大。 (3)在这些装置中发现低于阈值的受激发射很明显; (4)井上方势垒能级的载流子显示出高α值。最后,描述了一种方法,该方法通过使用与半导体激光器相同外延中的发射量子阱耦合的吸收量子阱,将α降低至几乎为零。

著录项

  • 作者

    Stohs, Jonathan.;

  • 作者单位

    The University of New Mexico.;

  • 授予单位 The University of New Mexico.;
  • 学科 Physics Optics.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 421 p.
  • 总页数 421
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;
  • 关键词

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