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Aspects of surface cleaning in dense carbon dioxide: Micron scale particle removal and mass transfer in micelle systems.

机译:致密二氧化碳中表面清洁的方面:胶束系统中的微米级颗粒去除和传质。

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Particle removal and micelle additives are important new areas of research into precision cleaning with near-critical carbon dioxide. Precision cleaning is an important step in the processes such as silicon chip manufacture, micro electronics, and medical sterilization. This study develops a particle adhesion model that incorporates the effect of high pressure on micron-sized particles, and describes the mass transfer characteristics of a micelle-modified CO 2 system.; The particle adhesion model includes the presence of a fluid layer on the surface and is descriptive of particulate adhesion in precision cleaning applications. The model is applied for an idealized system of graphite/ n-tetradecane/stainless steel at both low and high pressure, and calculations predict that high pressures (as would be required for liquid or supercritical CO2 cleaning) both increase the particle surface separation distance and decrease the net adhesion force. Experimental data under dynamic conditions validate the theoretical analysis. The data is analyzed to de-couple any effects of changing solvent properties on the particle removal, and results show that increasing system pressure can decrease the minimum required removal force for particles.; Micelle-modified CO2 systems are important because of their ability to solubilize heavy organics and polar compounds like proteins. Such research has focused on the phase equilibria to determine what chemical properties lead to surfactants that will form micelles in CO2. The mass transfer in CO2-micelle systems is relatively unstudied. Accurate descriptions of mass transfer properties are essential to design any processes based on this technology. This study also examines the mass transfer in a CO2 -micelle system using the solvatochromic probe methyl orange. An effective diffusivity model is presented and experimental data from the adsorption of methyl orange onto silica gel provides insight into the fundamental mechanisms of mass transfer.
机译:去除颗粒和胶束添加剂是使用近临界二氧化碳进行精密清洁的重要新研究领域。精密清洗是诸如硅芯片制造,微电子学和医疗灭菌等过程中的重要一步。该研究建立了一个颗粒粘附模型,该模型结合了高压对微米级颗粒的影响,并描述了胶束修饰的CO 2 系统的传质特性。颗粒粘附模型包括表面上存在流体层,并描述了精密清洁应用中的颗粒粘附。该模型适用于理想的石墨/ n -十四烷/不锈钢在低压和高压下的理想系统,计算结果表明,高压(如液态或超临界CO 所需) 2 清洁)既增加了颗粒表面的分离距离又降低了净附着力。动态条件下的实验数据验证了理论分析。分析数据以消除溶剂性质改变对颗粒去除的任何影响,结果表明,增加系统压力可以降低颗粒所需的最小去除力。胶束修饰的CO 2 系统非常重要,因为它们具有溶解重有机物和极性化合物(如蛋白质)的能力。这类研究集中于相平衡,以确定什么化学性质导致表面活性剂在CO 2 中形成胶束。在CO 2 胶束系统中的传质研究相对较少。传质的准确描述对于基于该技术的任何工艺设计至关重要。这项研究还使用溶剂变色探针甲基橙检查了CO 2 -胶束系统中的传质。提出了一个有效的扩散模型,并且甲基橙吸附到硅胶上的实验数据提供了对质量转移基本机理的了解。

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