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Ferromagnetism in indium manganese arsenide magnetic semiconductor thin films deposited by metalorganic vapor phase epitaxy.

机译:金属有机气相外延沉积的砷化铟锰磁性半导体薄膜中的铁磁性。

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摘要

The structure-property relationships of (In,Mn)As magnetic semiconductor thin films have been investigated to elucidate the mechanism of ferromagnetism and to assess its viability for use in spintronic device applications. Single phase, epitaxial (In,Mn)As films were deposited for the first time using atmospheric pressure metalorganic vapor phase epitaxy. The microstructure and phase composition of these films were determined using X-ray diffraction, transmission electron microscopy, and extended x-ray absorption fine structure measurements.; Magnetic properties of the films were examined using superconducting quantum interference device magnetometery. Room temperature ferromagnetism was observed in single-phase In1-xMn xAs films with x ≤ 0.10. Magnetization measurements indicated that these (In,Mn)As samples had a transition temperature of 298--333 K. The Curie temperature was effectively independent of Mn concentration over the range of 1--10%. The temperature dependent magnetization along with the magnitude of the saturation magnetization and microstructural analysis indicated that the source of the high-temperature ferromagnetism in single-phase films is not attributable to MnAs nanoprecipitates.; The Curie temperatures for these films are nearly constant for hole concentrations of 8 x 1017--1.6 x 1018 cm -3. In addition, the hole concentration is at least two orders of magnitude smaller than what is required under the conventional hole-mediated theory of ferromagnetism to obtain room-temperature ferromagnetism. Consequently, this model in its current form is not sufficient to describe the ferromagnetism in (In,Mn)As deposited using MOVPE.; A model based upon interacting atomic scale ferromagnetic clusters was developed. The ferromagnetic coupling between these clusters may be a hole-mediated mechanism. This model of interacting ferromagnetic clusters was very successful in describing both the temperature and field dependence of the magnetization. In addition, this model is able to explain the high Curie temperatures and the Mn concentration independence of the Curie temperature in these (In,Mn)As films.; This work has shown that the MOVPE deposited (In,Mn)As films are significantly different than those obtained by molecular beam epitaxy. The higher deposition temperature has been shown to significantly improve Mn solubility and allow for the formation of atomic scale clusters as predicted by recent theoretical calculations. These clusters stabilize the ferromagnetism to much higher temperatures than was previously observed in (In,Mn)As with random Mn substitution.
机译:已经研究了(In,Mn)As磁性半导体薄膜的结构-性质关系,以阐明铁磁性的机理并评估其在自旋电子器件应用中的可行性。使用大气压金属有机气相外延法首次沉积单相外延(In,Mn)As薄膜。使用X射线衍射,透射电子显微镜和扩展的X射线吸收精细结构测量来确定这些膜的微观结构和相组成。使用超导量子干涉仪磁力计检查了薄膜的磁性。在x≤0.10的单相In1-xMn xAs薄膜中观察到室温铁磁性。磁化测量表明,这些(In,Mn)As样品的转变温度为298--333 K.居里温度在1--10%的范围内有效地与Mn浓度无关。随温度变化的磁化强度以及饱和磁化强度和显微组织分析表明,单相膜中高温铁磁性的来源与MnAs纳米沉淀无关。对于8 x 1017--1.6 x 1018 cm -3的空穴浓度,这些薄膜的居里温度几乎恒定。另外,空穴浓度比常规的空穴介导的铁磁性理论下获得室温铁磁性所需的空穴浓度小至少两个数量级。因此,该模型目前的形式不足以描述使用MOVPE沉积的(In,Mn)As中的铁磁性。建立了基于相互作用的原子尺度铁磁簇的模型。这些簇之间的铁磁耦合可能是空穴介导的机制。这种相互作用的铁磁团簇模型在描述磁化强度的温度和磁场相关性方面非常成功。另外,该模型能够解释这些(In,Mn)As膜中的居里温度高和居里温度的Mn浓度独立性。这项工作表明,MOVPE沉积的(In,Mn)As薄膜与通过分子束外延获得的薄膜明显不同。如最近的理论计算所预测的那样,较高的沉积温度已显示可显着提高Mn的溶解度并允许形成原子尺度簇。这些簇将铁磁性稳定在比以前用随机Mn取代的(In,Mn)As中观​​察到的温度高得多的温度。

著录项

  • 作者

    Blattner, Aaron J.;

  • 作者单位

    Northwestern University.;

  • 授予单位 Northwestern University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2004
  • 页码 276 p.
  • 总页数 276
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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