Polishing of 3/4 inch silicon nitride balls using the large-batch magnetic float polishing apparatus.

摘要

Scope and method of study. The purpose of this study was to polish 3/4 inch silicon nitride (Si3N4) balls to the best possible sphericity and surface finish using the large batch magnetic float polishing apparatus. Objectives included: (1) optimize the system design so that consistent and repeatable results could be obtained, (2) investigate the parameters involved in order to develop a sequence of polishing runs that will produce a batch of ball to the best sphericity and surface finish. Parameters in this study are abrasive, load, speed, and run duration.; Findings and conclusions. Two batches of balls have been polished. Modifications were made to the design which enabled the results to be consistent for a given set of parameters. Following this, parameters were investigated and a polishing process was outlined which would polish a batch of forty-six balls in approximately twenty hours, to a quality level of grade 16, according to AFBMA specifications.