Fabrication and Characterization of Amorphous/Nanocrystalline Thin Film Composite.

摘要

Combining the absorption abilities of amorphous silicon and the electron transport capabilities of crystalline silicon would be a great advantage to not only solar cells but other semiconductor devices. In this work composite films were created using molecular beam epitaxy and electron beam deposition interchangeably as a method to create metallic precursors. Aluminum induced crystallization techniques were used to convert an amorphous silicon film with a capping layer of aluminum nanodots into a film composed of a mixture of amorphous silicon and nanocrystalline silicon. This layer was grown into the amorphous layer by cannibalizing a portion of the amorphous silicon material during the aluminum induced crystallization. Characterization was performed on films and metallic precursors utilizing SEM, TEM, ellipsometry and spectrophotometer.