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Phosphorus incorporation during silicon(001):phosphorus gas-source molecular beam epitaxy: Effects on film growth kinetics, surface morphology, and the self-organization of germanium quantum dot overlays.

机译:硅(001):磷气源分子束外延过程中的磷掺入:对薄膜生长动力学,表面形态和锗量子点覆盖层的自组织的影响。

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摘要

The effects of P doping on growth kinetics and surface morphological evolution during Si(001):P gas-source molecular-beam epitaxy from Si 2H6 and PH3 at temperatures Ts = 500-900°C have been investigated. With increasing PH3/Si2H 6 flux ratio JP/Si at constant Ts, I observe a decrease in the film growth rate R and an increase in the incorporated P concentration CP, both of which tend towards saturation at high flux ratios, accompanied by increased surface roughening and pit formation. I use in-situ isotopically tagged D2 temperature programmed desorption (TPD) to follow changes in film surface composition and dangling bond density thetadb as a function of JP/Si and T s. The steady-state P surface coverage thetaP reaches a maximum value of ∼1 ML at Ts = 550°C, and decreases with Ts > 600°C due to the onset of P2 desorption. Comparison of thetaP(Ts) with CP(Ts) results obtained during film growth reveals the presence of strong P surface segregation, with a P segregation enthalpy DeltaHs= -0.86 eV. Using the combined set of results, I develop a predictive model for CP vs. T s and JP/Si, incorporating the dependence of the PH 3 reactive sticking probability SPH3 on thetaP, which provides an excellent fit to the experimental data.; I build upon these results to understand the effect of growth rate and P predeposition on Ge/Si(001) island geometry, density, and spatial distributions. Ge quantum dots are deposited on three types of starting surfaces: (1) Si(001) buffer layers which serve as a reference, (2) Si(001) layers with predeposited P coverages thetaP ranging from 0 to 1 ML, and (3) P-doped Si(001) with CP = 3.4x1018-8.3x10 18 cm-3, which corresponds to thetaP = 0.5-0.8 ML. Predeposited P passivates and roughens the Si(001) surface, which inhibits surface diffusion and causes an increase in Ge island density and pyramid-to-dome ratio, accompanied by enhanced island self-organization along 100> directions.
机译:研究了在温度为Ts = 500-900°C的条件下,Si 2H6和PH3对Si(001):P气源分子束外延生长过程中P掺杂对生长动力学和表面形态演变的影响。随着在恒定的Ts下PH3 / Si2H 6的通量比JP / Si的增加,我观察到了膜生长速率R的降低和掺入的P浓度CP的增加,两者都倾向于在高通量比下趋于饱和,同时表面增加粗糙和凹坑形成。我使用原位同位素标记的D2温度程序解吸(TPD)来跟踪膜表面组成和悬空键密度thetadb随JP / Si和Ts的变化。在Ts = 550°C时,稳态P表面覆盖thetaP达到最大值〜1 ML,并且由于P2解吸的开始,在Ts> 600°C时减小。在薄膜生长过程中获得的thetaP(Ts)与CP(Ts)结果的比较表明,存在强大的P表面偏析,P偏析焓DeltaHs = -0.86 eV。使用组合的结果集,我开发了CP与T s和JP / Si的预测模型,并结合了PH 3反应性粘附概率SPH3对thetaP的依赖性,这非常适合实验数据。我基于这些结果来了解增长率和P沉积对Ge / Si(001)岛的几何形状,密度和空间分布的影响。 Ge量子点沉积在三种类型的起始表面上:(1)作为参考的Si(001)缓冲层;(2)预先沉积的P覆盖度为0到1 ML的Si(001)层;以及(3 )P掺杂的Si(001),CP = 3.4x1018-8.3x10 18 cm-3,对应于theP = 0.5-0.8 ML。预沉积的P使Si(001)表面钝化并变粗糙,这会抑制表面扩散并导致Ge岛密度和角锥比增加,同时沿<100>方向的岛自组织增强。

著录项

  • 作者

    Cho, Benjamin.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2007
  • 页码 106 p.
  • 总页数 106
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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