Low-loss dual-wave laser optics coatings at 1060 nm and 530 nm

摘要

Red-to-green laser conversion requires dual-wave laser optics coatings at 1060nm and 530nm. Loss analysis of the dual-wave coatings were presented for 3 types of coating designs with a coating material combination of HfO2/SiO2. Homogeneity and smoothness of the HfO2/SiO2 multilayers via standard plasma ion assisted deposition were evaluated. A modified plasma ion assisted deposition process with in-situ plasma smoothing was developed to deposit dense and smooth HfO2/SiO2 multilayers. Improved film microstructure was revealed on single layer and multilayer coated samples by means of atomic force microscopy and scanning electron microscopy. The improved film microstructure led to low loss and laser durable coating performance