首页> 外文会议>Vacuum and surface engineering. >Magnetron Sputtering Fabrication of the Back Electrode of Glass Nanofluidic Diode
【24h】

Magnetron Sputtering Fabrication of the Back Electrode of Glass Nanofluidic Diode

机译:磁控溅射法制备玻璃纳米流体二极管的背面电极

获取原文
获取原文并翻译 | 示例

摘要

Due to the scale of nanofluidic diode equivalent to biologic molecule,many unique characteristics appeared as the micorfluidic channel narrowed its size to nanometer. The fabrication was even more different. According to the design of nanofluidic diode chips,the sketch of back electrode was designed with a mask. Then magnetron sputtering method was used to fabricate the back electrodes. The manufacturing parameters were discussed and optimized through SEM characterizations. The results can direct the fabrication process of such metal electrodes.
机译:由于相当于生物分子的纳米流体二极管的规模,当微流体通道将其尺寸缩小至纳米时,出现了许多独特的特征。制作过程甚至有所不同。根据纳米流体二极管芯片的设计,用掩模设计了背面电极的草图。然后,使用磁控溅射法制造背电极。通过SEM表征讨论并优化了制造参数。结果可以指导这种金属电极的制造过程。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号