MULTI-SCALE ALIGNMENT POSITIONING SYSTEM FOR NIL

机译：NIL的多尺度对齐定位系统

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This paper describes the design of Multi-Scale Alignment Positioning System (MAPS) a nano precision stage with six-degrees of freedom designed to perform Nanoimprint Lithography (NIL) on the surface of 50.8 mm substrates and to perform surface topography measurements of the features generated by NIL.

机译：本文介绍了具有六自由度的纳米级精密平台多尺度对准定位系统（MAPS）的设计，该平台旨在在50.8毫米基板的表面上执行纳米压印光刻（NIL）并执行所生成特征的表面形貌测量由NIL。

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《The Twenty-third annual meeting of the American Society of Precision Engineering and the Twelfth ICPE》|2008年|324-327|共4页
会议地点 Portland OR(US);Portland OR(US);Portland OR(US);Portland OR(US)
作者
Ozkan Ozturk; Ronnie R. Fesperman; Greg W Caskey; Robert J Hocken;
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作者单位

Center for Precision Metrology, University of North Carolina at Charlotte, Charlotte, NC, USA;

Moore Tool Company, Bridgeport, CT, USA;

Center for Precision Metrology, University of North Carolina at Charlotte, Charlotte, NC, USA;

Center for Precision Metrology, University of North Carolina at Charlotte, Charlotte, NC, USA;

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原文格式 PDF
正文语种 eng
中图分类仪器、仪表;
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4. MULTI-SCALE ALIGNMENT POSITIONING SYSTEM FOR NIL [C] . Ozkan Ozturk, Ronnie R. Fesperman, Greg W Caskey, Annual Meeting of The American Society for Precision Engineering . 2008

机译：NIL的多尺度对准定位系统
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MULTI-SCALE ALIGNMENT POSITIONING SYSTEM FOR NIL

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