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CONTROL STRATEGIES FOR A DYNAMIC POSITIONING MACHINE AT NANOMETER LEVEL

机译:纳米级动态定位机的控制策略

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摘要

A dynamic positioning machine for nanospale engineering has been developed. The system comprises of a 2 DOF long range translation stage carrying a 6 DOF short range stage. The long range stage can traverse an area of 50 mm × 50 mm while the short range stage can provide up to 17 micrometers of linear positioning and 160 × 10~(-6) radians of angular motion to compensate errors generated by the long range stage during traverses. Currently, positioning of the x- and y-axis along with angular motion about the z-axis is monitored by laser interferometers, while positioning of the z-axis and angular motion of x- and y-axis are monitored by 3 capacitance gages. Figure 1 shows the positioning stage and the two different measurement systems.
机译:已经开发了用于纳米颗粒工程的动态定位机。该系统由一个2 DOF远程平移台和一个6 DOF短程台构成。远距离镜台可移动50 mm×50 mm的区域,而近距离镜台可提供高达17微米的线性定位和160×10〜(-6)弧度的弧度运动,以补偿远距离镜台产生的误差在遍历中。当前,x和y轴的定位以及绕z轴的角运动由激光干涉仪监控,而z轴的定位以及x和y轴的角运动由3个电容计监控。图1显示了定位台和两个不同的测量系统。

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