首页> 外文会议>Twenty-First Annual Meeting of the American Society for Precision Engineering >POLISHER LIFE IN ULTRA-SMOOTHNESS POLISHING OF MAGNETIC DISK SUBSTRATE USING NEW DOUBLE SIDE SURFACE POLISHING MACHINE
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POLISHER LIFE IN ULTRA-SMOOTHNESS POLISHING OF MAGNETIC DISK SUBSTRATE USING NEW DOUBLE SIDE SURFACE POLISHING MACHINE

机译:使用新型双面研磨机对磁盘基质进行超光滑抛光的抛光剂寿命

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摘要

The main conclusions obtained are as follows: (1) The removal rate with polishing process changes in the four stages, which are the initial removal rate reducing stage, the steady removal rate stage, the later removal rate reducing stage and the extremely small removal rate stage corresponding to the life time. (2) The terminal surface roughness is at almost the same from the beginning of polishing to polisher life. (3) The polisher life occurs when the small hole on the polisher surface is mostly embedded by colloidal silica abrasives.
机译:得到的主要结论如下:(1)随着抛光工艺的去除率在四个阶段发生变化,即初始去除率降低阶段,稳定去除率阶段,后期去除率降低阶段和极小的去除率。生命周期对应的阶段。 (2)从抛光开始到抛光机寿命,端子表面粗糙度几乎相同。 (3)当抛光剂表面上的小孔大部分被胶体二氧化硅磨料嵌入时,抛光剂的寿命就出现了。

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