National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Yu Tian Road 500, Shanghai 200083, P.R. China;
crystallographic orientation; ferroelectric properties; Bi_(3.25)La_(0.75)Ti_3O_(12) films; Bi_(3.25)Nd_(0.75)Ti_3O_(12) films;
机译:三层Bi_(3.25)La_(0.75)Ti_3O_(12)/ BiFeO_3 / Bi_(3.25)La_(0.75)Ti_3O_(12)结构中BiFeO_3膜的制备和磁性
机译:YSZ(100)上多对SrRuO_3 / Pt(111)电极上的(104)取向Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.54)Nd_(0.46)Ti_3O_(12)铁电薄膜的微观结构缓冲硅(100)
机译:用于存储器的Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.25)Pr_(0.75)Ti_3O_(12)薄膜的结构和电学性质
机译:Bi_(3.25)的结构和铁电性能La_(0.75)Ti_3O_(12)和Bi_(3.25)ND_(0.75)Ti_3O_(12)通过MOD方法制备的薄膜
机译:金属有机沉积(MOD)技术制备的富锆的铅(x(x)钛(1-x))氧(3)薄膜的微观结构和性能。
机译:共掺杂铋层结构Bi3.25La0.75(Ti1-xMox)3O12陶瓷的结构性质关系
机译:Bi3.25LA0.75TI3O12薄膜的铁电性能和漏电流特性通过聚合物前体法制备