首页> 外文会议>Thin Film Physics and Applications >Structure and ferroelectric properties of Bi_(3.25)La_(0.75)Ti_3O_(12) and Bi_(3.25)Nd_(0.75)Ti_3O_(12) thin films prepared by a MOD method
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Structure and ferroelectric properties of Bi_(3.25)La_(0.75)Ti_3O_(12) and Bi_(3.25)Nd_(0.75)Ti_3O_(12) thin films prepared by a MOD method

机译:MOD法制备Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.25)Nd_(0.75)Ti_3O_(12)薄膜的结构和铁电性能

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The structure and ferroelectric properties of Bi_(3.25)La_(0.75)Ti_3O_(12) (BLT) and Bi_(3.25)Nd_(0.75)Ti_3O_(12) (BNT) thin films deposited on (111)Pt/Ti/SiO_2/Si substrates using a metalorganic decomposition (MOD) method were investigated. Both the films were polycrystalline structure with the single bismuth-layered phase. The BNT film showed the (117) random orientation, while the BLT film displayed (00l)-preferential orientation. The BNT film showed a larger remnant polarization (~13.8 μC/cm~2) than the BLT film (~3.5 μC/cm~2), while both films displayed almost the same value of coercive field. The BNT film had the larger dielectric constant and a litter larger dissipation factor than the BLT film. The superior ferroelectricity of the BNT film was mainly attributed to its (117) random orientation. Furthermore, the BNT film displayed good fatigue endurance up to 10~9 switching cycles, indicating it was a useful candidate for integrated device applications.
机译:在(111)Pt / Ti / SiO_2 /上沉积的Bi_(3.25)La_(0.75)Ti_3O_(12)(BLT)和Bi_(3.25)Nd_(0.75)Ti_3O_(12)(BNT)薄膜的结构和铁电性能研究了使用金属有机分解(MOD)方法的Si衬底。两种膜均为具有单铋层相的多晶结构。 BNT膜显示(117)随机取向,而BLT膜显示(00l)优先取向。 BNT薄膜的剩余极化强度(〜13.8μC/ cm〜2)比BLT薄膜(〜3.5μC/ cm〜2)大,而两层薄膜的矫顽力几乎相同。与BLT膜相比,BNT膜具有更大的介电常数和更大的损耗因子。 BNT膜的优越铁电性主要归因于其(117)随机取向。此外,BNT膜在10〜9个开关周期内显示出良好的耐疲劳性,表明它是集成器件应用的有用选择。

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