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The Fabrication of Sub-micron Size Cesium Iodide X-Ray Scintillator

机译:亚微米级碘化铯X射线闪烁器的制备

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The cesium iodide (CsI) scintillator can converts incident X-ray into visible light with very high conversion efficiency of optical photons. The incident energy, response time, film thickness, sample size, and spatial resolution require in engineering and medical applications are difference. A smooth and flat surface and single crystal structure of CsI enhance the X-ray to visible light conversion. However, the regular CsI is soft and extremely hygroscopic; it is very difficult to polish to obtain a smooth and optical flat plane. In order to obtain a good quality of CsI scintillator for X-ray application we used an ordering channel as template and formed sub-micron CsI wire in the template. The fabrication process including: (1) Ordering structure of nano or sub-micron channels were made by an anodization method; (2) fill CsI scintillated film on the channel by CsI solution, (3) fill CsI melt into the channel formation single crystal of sub-micron crystalline scintillator after solidification. The non-vacuum processes of anodization and solidication methods were used for the sub-micron CsI scintillator column formation that is cost down the scintillator fabrication. In addition, through the fabrication method, the ordering structure scintillator of scintillator can be made by anodic treatment and die casting technology with low cost and rapid production; moreover, the film oxidized metal tubes of the tubular template can be further manufactured to nano tubes by adjusting electrolyte composition, electrolysis voltage, and processing time of anodic treatment, and the aperture size, the thickness and the vessel density of the nano tube can be controlled and ranged from 10 nm to 500 nm, 0.1 μm to 1000 μm, and hundred million to thousand billion tube/cm~2, respectively.
机译:碘化铯(CsI)闪烁体可以非常高的光学光子转换效率将入射的X射线转换为可见光。工程和医疗应用中所需的入射能量,响应时间,薄膜厚度,样品大小和空间分辨率是不同的。 CsI的光滑,平坦的表面和单晶结构增强了X射线到可见光的转换。但是,常规的CsI柔软且极易吸湿。抛光以获得光滑光学平面非常困难。为了获得用于X射线应用的高质量CsI闪烁体,我们使用了一个订购通道作为模板,并在模板中形成了亚微米级CsI导线。其制造过程包括:(1)通过阳极氧化法制备纳米或亚微米通道的有序结构; (2)用CsI溶液在通道上填充CsI闪烁膜,(3)凝固后将CsI熔体填充到亚微米晶状闪烁体的通道形成单晶中。阳极化和固化方法的非真空过程用于亚微米CsI闪烁体柱的形成,其成本比闪烁体的制造成本低。另外,通过该制造方法,可以通过阳极处理和压铸技术制造闪烁器的有序结构闪烁器,成本低,生产快。另外,通过调整电解液的组成,电解电压和阳极处理的时间,可以将管状模板的膜氧化金属管进一步制成纳米管,并且可以使纳米管的孔径,厚度和容器密度为控制范围为10 nm至500 nm,0.1μm至1000μm和一亿至一万亿个tube / cm〜2。

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