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Photoluminescence within Crystalline-Si/SiO_2 Single Quantum Wells

机译:晶体Si / SiO_2单量子阱中的光致发光

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摘要

Ultrathin single quantum wells of crystalline silicon (c-Si) confined by SiO_2 have been prepared by chemical and thermal processing of silicon-on-insulator wafers. The photoluminescence (PL) produced by these nanometer-thick single wells contains two bands: one exhibits a peak energy of ~1.8 eV, while the second increases rapidly in peak energy with decreasing c-Si layer thickness. Comparison with theories based on self-consistent first-principles calculations shows that the increase in PL peak energy of the second band is consistent with that predicted for the c-Si energy gap of such wells. It also agrees with the measured band gap variation. The ~1.8 eV PL band is attributed to the recombination of electron-hole pairs confined at the c-Si/SiO_2 interface.
机译:通过绝缘体上硅片的化学和热处理,制备了由SiO_2限制的晶体硅(c-Si)超薄单量子阱。这些纳米厚的单孔产生的光致发光(PL)包含两个带:一个带的峰值能量约为1.8 eV,而第二个带的峰值能量随着c-Si层厚度的减小而迅速增加。与基于自一致的第一性原理计算的理论比较表明,第二个谱带的PL峰值能量的增加与此类井的c-Si能隙预测的一致。它也与测得的带隙变化一致。 〜1.8 eV PL带归因于限制在c-Si / SiO_2界面上的电子-空穴对的复合。

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