Electrical characterization of nanostructured carbon films produced by Supersonic Cluster Beam Deposition

摘要

Electrical conduction in nanostructured carbon (ns-C) films produced by deposition of a supersonic beam of neutral carbon clusters has been studied. The d.c. conduction properties of these films have been measured in-situ during the deposition process and ex-situ as a function of the temperature in vacuum and in ambient of different gases (H_2, N_2, CH_4, He). The ns-C films exhibit an ohmic behavior with a room temperature resistivity in the range 10MΩcm-1GΩcmdepending on the growth and storage conditions. Conductivity vs. temperature measured in vacuum in the range 300-400K is characterized by activation energies in the range 0.3-0.7eV, the current response does not differ significantly in gas atmosphere.